Alternative lithographic technologies III (1-3 March 2011, San Jose, California, United States)Herr, Daniel J. C.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 1 vol, isbn 978-0-8194-8529-8Conference Proceedings

Alternative lithographic technologies II (23-25 February 2010, San Jose, California, United States)Herr, Daniel J. C.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 1 online resource, isbn 978-0-8194-8051-4 0-8194-8051-7Conference Proceedings

Development and characterization of carbon nanotube processes for NRAM technologyAMBLARD, Gilles.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797017.1-797017.7Conference Paper

The comparison of NGLs from a tool vendor's viewSUZUKI, Akiyoshi.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797005.1-797005.12Conference Paper

Automating Molecular Transfer Lithography at 25nm on 200mm Wafers, Including Site-Remote Coating of Resist on Dissolvable TemplatesSCHAPER, Charles D.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 76370U.1-76370U.9Conference Paper

E-beam Mask-less Lithography: prospects and challengesRONSE, Kurt.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 76370A.1-76370A.7Conference Paper

Maskless Lithography and Nanopatterning with Electron and Ion Multi-Beam ProjectionPLATZGUMMER, Elmar.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 763703.1-763703.12Conference Paper

A Lossless Circuit Layout Image Compression Algorithm for Electron Beam Direct Write Lithography SystemsYANG, Jeehong; SAVARI, Serap A.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701U.1-79701U.12Conference Paper

Full-chip high resolution electron-beam lithography proximity effect correction modelingISOYAN, Artak; MELVIN, Lawrence S.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 76370X.1-76370X.9Conference Paper

Double and Triple Exposure With Image Reversal in a Single Photoresist LayerNDOYE, Coumba; ORLOWSKI, Marius.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701H.1-79701H.10Conference Paper

Fast Mask Writers: Technology Options and ConsiderationsLITT, Lloyd C; GROVES, Timothy.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700X.1-79700X.9Conference Paper

Optimization of e-beam landing energy for EBDWLIU, Enden D; PRESCOP, Ted.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701S.1-79701S.10Conference Paper

Step and Flash Imprint Lithography for Semiconductor High Volume Manufacturing?MALLOY, M; LITT, L. C.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 763706.1-763706.11Conference Paper

Data path development for multiple electron beam maskless lithographyKRECINIC, Faruk; LIN, Shy-Jay; CHEN, Jack J. H et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797010.1-797010.10Conference Paper

Fast and large-field electron-beam exposure by CSELKOJIMA, A; OHTA, T; OHYI, H et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701R.1-79701R.10Conference Paper

Scatterometry Sensitivity for NIL ProcessMIYAKAWA, Takahiro; SATO, Kazuhiro; SENTOKU, Koich et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701N.1-79701N.7Conference Paper

A First Order Analysis of Scatterometry Sensitivity for NIL ProcessMIYAKAWA, Takahiro; SENTOKU, Koich; SATO, Kazuhiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 763721.1-763721.7Conference Paper

Design and Fabrication of Si-based photonic crystal stamps with Electron Beam Lithography (EBL)JANNESARY, Reihaneh; BERGMAIR, Iris; ZAMIRI, Saeid et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 763720.1-763720.8Conference Paper

Nanoimprint Lithography for Semiconductor Devices and Future Patterning InnovationHIGASHIKI, Tatsuhiko; NAKASUGI, Tetsuro; YONEDA, Ikuo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797003.1-797003.6Conference Paper

CP based EBDW throughput enhancement for 22nm high volume manufacturingMARUYAMA, Takashi; MACHIDA, Y; SUGATANI, S et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 76371S.1-76371S.8Conference Paper

Evaluation of maskless electron beam direct writing with double character projection aperturesMIDOH, Y; TERASAKA, T; NAKAMAE, K et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 76370D.1-76370D.9Conference Paper

High throughput plasmonic lithography for sub 50nm patterning with a contact probeKIM, Yongwoo; KIM, Seok; JUNG, Howon et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 76371F.1-76371F.7Conference Paper

Model-Based Mask Data Preparation (MB-MDP) and its impact on resist heatingFUJIMURA, Aki; KAMIKUBO, Takashi; BORK, Ingo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 797012.1-797012.10Conference Paper

Position Accuracy Evaluation of Multi Column E-beam Exposure SystemTAKIZAWA, Masahiro; KOMAMI, Hideaki; KUROKAWA, Masaki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79700B.1-79700B.8Conference Paper

Biomolecular Architectures and Systems for Nanoscience EngineeringCHA, Jennifer N; HUNG, Albert M; NOH, Hyunwoo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 763710.1-763710.8Conference Paper